KMID : 1024520000090040311
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Journal of the Environmental Sciences 2000 Volume.9 No. 4 p.311 ~ p.318
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CO©üSeparation Using Surface Modified Silica Membrane
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Kim Sung-Soo
Choi Hyun-Gyo Park Hong-Chae Kim Tae-Ok Sea Bong-Kuk
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Abstract
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To improve pemselectivity, a modified silica membrane was prepared by chemical vapor deposition with tetraethoxysilane(TEOS)-ethanol-water, and TEOS-ethanol-water-HCI solution at 300-. The silica was effectively deposited in the mesopores of a -alumina film coated on a porous -alumina tube by evacuating the reactants through the porous wall. In this membrane, interacts, to some extent, with the pore wall, and /selectivity then exceeds the value of the Knudsen diffusion mechanism, while the membrane derived from TEOS alone has no selectivity. The silica membrane prepared from TEOS-ethanol-water-HCI solution showed that permeance was $2.510^{-7}mol/s^{-1}.m^{-2}.Pa^{-1} at 30{\circ}C$ and /selectivity was approximately 3. The permeance and selectivity was improved by enlarging the surface diffusion with modification of chemical affinity of the silica pores
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KEYWORD
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Silica, Membrane, Chemical vapor deposition, CO©ü separation
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