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KMID : 1024520000090040311
Journal of the Environmental Sciences
2000 Volume.9 No. 4 p.311 ~ p.318
CO©üSeparation Using Surface Modified Silica Membrane
Kim Sung-Soo

Choi Hyun-Gyo
Park Hong-Chae
Kim Tae-Ok
Sea Bong-Kuk
Abstract
To improve pemselectivity, a modified silica membrane was prepared by chemical vapor deposition with tetraethoxysilane(TEOS)-ethanol-water, and TEOS-ethanol-water-HCI solution at 300-. The silica was effectively deposited in the mesopores of a -alumina film coated on a porous -alumina tube by evacuating the reactants through the porous wall. In this membrane, interacts, to some extent, with the pore wall, and /selectivity then exceeds the value of the Knudsen diffusion mechanism, while the membrane derived from TEOS alone has no selectivity. The silica membrane prepared from TEOS-ethanol-water-HCI solution showed that permeance was $2.510^{-7}mol/s^{-1}.m^{-2}.Pa^{-1} at 30{\circ}C$ and /selectivity was approximately 3. The permeance and selectivity was improved by enlarging the surface diffusion with modification of chemical affinity of the silica pores
KEYWORD
Silica, Membrane, Chemical vapor deposition, CO©ü separation
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